Numerical modeling of <i>SiC</i> by low-pressure chemical vapor deposition from methyltrichlorosilane

Kang Guan, Yong Gao, Qingfeng Zeng, Xingang Luan, Yi Zhang, Laifei Cheng, Jianqing Wu, Zhenya Lu

Chinese Journal of Chemical Engineering . 2020, (6): 1733 -1743 . DOI: 10.1016/j.cjche.2020.03.035