SCI和EI收录∣中国化工学会会刊

• REACTION KINETICS, CATALYSIS AND…… •

### An Axial Dispersion Model for Evaporating Bubble Column Reactor

XIE Gang; LI Xi

1. Department of Chemical and Biochemical Engineering, Zhejiang University, Hangzhou 310027,
China
• Received:1900-01-01 Revised:1900-01-01 Online:2004-04-28 Published:2004-04-28
• Contact: XIE Gang

### 蒸发鼓泡塔反应器的轴向分散模型

1. Department of Chemical and Biochemical Engineering, Zhejiang University, Hangzhou 310027,
China
• 通讯作者: 谢刚

Abstract: Evaporating bubble column reactor (EBCR) is a kind of aerated reactor in which the reaction
heat is removed by the evaporation of volatile reaction mixture. In this paper, a
mathematical model that accounts for the gas-liquid exothermic reaction and axial
dispersions of both gas and liquid phase is employed to study the performance of EBCR for
the process of p-xylene(PX) oxidation. The computational results show that there are
remarkable concentration and temperature gradients in EBCR for high ratio of height to
diameter (H/DT). The temperature is lower at the bottom of column and higher at the top,
due to rapid evaporation induced by the feed gas near the bottom. The concentration
profiles in the gas phase are more nonuniform than those (except PX) in the liquid phase,
which causes more solvent burning consumption at high H/DT ratio. For p-xylene oxidation,
theo ptimal H/DT is around 5.

heat is removed by the evaporation of volatile reaction mixture. In this paper, a
mathematical model that accounts for the gas-liquid exothermic reaction and axial
dispersions of both gas and liquid phase is employed to study the performance of EBCR for
the process of p-xylene(PX) oxidation. The computational results show that there are
remarkable concentration and temperature gradients in EBCR for high ratio of height to
diameter (H/DT). The temperature is lower at the bottom of column and higher at the top,
due to rapid evaporation induced by the feed gas near the bottom. The concentration
profiles in the gas phase are more nonuniform than those (except PX) in the liquid phase,
which causes more solvent burning consumption at high H/DT ratio. For p-xylene oxidation,
theo ptimal H/DT is around 5.