SCI和EI收录∣中国化工学会会刊
Thermodynamic behaviors of SiCl2 in silicon deposition by gas phase zinc reduction of silicon tetrachloride
Yanqing Hou, Zhifeng Nie, Gang Xie, Rongxing Li, Xiaohua Yu, Plant A. Ramachandran
Thermodynamic behaviors of SiCl2 in silicon deposition by gas phase zinc reduction of silicon tetrachloride
Yanqing Hou, Zhifeng Nie, Gang Xie, Rongxing Li, Xiaohua Yu, Plant A. Ramachandran
. 2015, (3): 552 -558 .  DOI: 10.1016/j.cjche.2014.04.001