SCI和EI收录∣中国化工学会会刊

Chinese Journal of Chemical Engineering ›› 2023, Vol. 60 ›› Issue (8): 99-107.DOI: 10.1016/j.cjche.2023.01.008

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Uniform deposition of ultra-thin TiO2 film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu1, Ying Li2, Rui Wang1, Guoqiang Shao1, Pengpeng Lv1, Jun Li1, Qingshan Zhu1,3   

  1. 1. State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China;
    2. School of Chemical & Environmental Engineering, China University of Mining and Technology-Beijing, Beijing 100083, China;
    3. School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • Received:2022-08-19 Revised:2023-01-05 Online:2023-10-28 Published:2023-08-28
  • Contact: Pengpeng Lv,E-mail:lvpengpeng@ipe.ac.cn;Qingshan Zhu,E-mail:qszhu@ipe.ac.cn
  • Supported by:
    The authors would like to acknowledge the support from National Natural Science Foundation of China (22208355, 22178363 and 21978300) and the financial support and mica samples from Changzi Wu and RIKA technology CO., LTD.

Uniform deposition of ultra-thin TiO2 film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu1, Ying Li2, Rui Wang1, Guoqiang Shao1, Pengpeng Lv1, Jun Li1, Qingshan Zhu1,3   

  1. 1. State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China;
    2. School of Chemical & Environmental Engineering, China University of Mining and Technology-Beijing, Beijing 100083, China;
    3. School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 通讯作者: Pengpeng Lv,E-mail:lvpengpeng@ipe.ac.cn;Qingshan Zhu,E-mail:qszhu@ipe.ac.cn
  • 基金资助:
    The authors would like to acknowledge the support from National Natural Science Foundation of China (22208355, 22178363 and 21978300) and the financial support and mica samples from Changzi Wu and RIKA technology CO., LTD.

Abstract: The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl4 concentration on the initial deposition of TiO2 on mica by atmospheric pressure chemical vapor deposition (APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO2 grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl4 concentration increased from 0.38% to 2.44%. The grain size increased with the TiCl4 concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO2 clusters at the initial stage finally result to the agglomeration of fine TiO2 grains at high TiCl4 concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl4 concentration is below 0.90%.

Key words: Chemical vapor deposition, TiO2 thin film, Nucleation reaction, Precursor concentration, Pearlescent pigment

摘要: The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl4 concentration on the initial deposition of TiO2 on mica by atmospheric pressure chemical vapor deposition (APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO2 grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl4 concentration increased from 0.38% to 2.44%. The grain size increased with the TiCl4 concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO2 clusters at the initial stage finally result to the agglomeration of fine TiO2 grains at high TiCl4 concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl4 concentration is below 0.90%.

关键词: Chemical vapor deposition, TiO2 thin film, Nucleation reaction, Precursor concentration, Pearlescent pigment