Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

›› 2009, Vol. 17 ›› Issue (6): 919-924.

Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

尤学一¹, 李胜华²

1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, China;
2. School of Chemical Engineering, Tianjin University, Tianjin 300072, China

收稿日期:2009-02-24 修回日期:2009-09-18 出版日期:2009-12-28 发布日期:2009-12-28
通讯作者: YOU Xueyi,E-mail:xyyou@tju.edu.cn
基金资助:
Supported by the National Natural Science Foundation of China (20676093)

Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

YOU Xueyi¹, LI Shenghua²

1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, China;
2. School of Chemical Engineering, Tianjin University, Tianjin 300072, China

Received:2009-02-24 Revised:2009-09-18 Online:2009-12-28 Published:2009-12-28
Supported by:
Supported by the National Natural Science Foundation of China (20676093)

摘要/Abstract

摘要： Microchannel reactors are commonly used in micro-chemical technology.The performance of microreactors is greatly affected by the velocity field in the microchannel.The flow field is disturbed by the cylindrical etch holes caused by air dust on the microchannel surface during its processing procedure.In this approach,a two-dimensional computational fluid dynamics(CFD) model is put forward to study the effect of etch holes on flow field.The influenced area of single or two concave etch holes is studied for the case of laminar flow.The hole diameter,the Reynolds number and the distance between the center of holes are found to have influences on the flow field.Numerical results indicate that the effects of etch hole on the flow field should be evaluated and the way of choosing the economic class of cleanroom for microreactor manufacture is presented.

关键词: microchannel, processing faults, etch holes, computational fluid dynamics, velocity field

Abstract: Microchannel reactors are commonly used in micro-chemical technology.The performance of microreactors is greatly affected by the velocity field in the microchannel.The flow field is disturbed by the cylindrical etch holes caused by air dust on the microchannel surface during its processing procedure.In this approach,a two-dimensional computational fluid dynamics(CFD) model is put forward to study the effect of etch holes on flow field.The influenced area of single or two concave etch holes is studied for the case of laminar flow.The hole diameter,the Reynolds number and the distance between the center of holes are found to have influences on the flow field.Numerical results indicate that the effects of etch hole on the flow field should be evaluated and the way of choosing the economic class of cleanroom for microreactor manufacture is presented.

Key words: microchannel, processing faults, etch holes, computational fluid dynamics, velocity field

尤学一, 李胜华. Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors[J]. , 2009, 17(6): 919-924.

YOU Xueyi, LI Shenghua. Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors[J]. , 2009, 17(6): 919-924.

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Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

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