Uniform deposition of ultra-thin TiO<sub>2</sub> film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu, Ying Li, Rui Wang, Guoqiang Shao, Pengpeng Lv, Jun Li, Qingshan Zhu

Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu, Ying Li, Rui Wang, Guoqiang Shao, Pengpeng Lv, Jun Li, Qingshan Zhu

中国化学工程学报 . 2023, (8): 99 -107 . DOI: 10.1016/j.cjche.2023.01.008