Uniform deposition of ultra-thin TiO2 film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

doi:10.1016/j.cjche.2023.01.008

中国化学工程学报 ›› 2023, Vol. 60 ›› Issue (8): 99-107.DOI: 10.1016/j.cjche.2023.01.008

• Full Length Article • 上一篇下一篇

Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu¹, Ying Li², Rui Wang¹, Guoqiang Shao¹, Pengpeng Lv¹, Jun Li¹, Qingshan Zhu^1,3

1. State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China;
2. School of Chemical & Environmental Engineering, China University of Mining and Technology-Beijing, Beijing 100083, China;
3. School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

收稿日期:2022-08-19 修回日期:2023-01-05 出版日期:2023-08-28 发布日期:2023-10-28
通讯作者: Pengpeng Lv,E-mail:lvpengpeng@ipe.ac.cn;Qingshan Zhu,E-mail:qszhu@ipe.ac.cn
基金资助:
The authors would like to acknowledge the support from National Natural Science Foundation of China (22208355, 22178363 and 21978300) and the financial support and mica samples from Changzi Wu and RIKA technology CO., LTD.

Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu¹, Ying Li², Rui Wang¹, Guoqiang Shao¹, Pengpeng Lv¹, Jun Li¹, Qingshan Zhu^1,3

1. State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, China;
2. School of Chemical & Environmental Engineering, China University of Mining and Technology-Beijing, Beijing 100083, China;
3. School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

Received:2022-08-19 Revised:2023-01-05 Online:2023-08-28 Published:2023-10-28
Contact: Pengpeng Lv,E-mail:lvpengpeng@ipe.ac.cn;Qingshan Zhu,E-mail:qszhu@ipe.ac.cn
Supported by:
The authors would like to acknowledge the support from National Natural Science Foundation of China (22208355, 22178363 and 21978300) and the financial support and mica samples from Changzi Wu and RIKA technology CO., LTD.

摘要/Abstract

摘要： The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl₄ concentration on the initial deposition of TiO₂ on mica by atmospheric pressure chemical vapor deposition (APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO₂ grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl₄ concentration increased from 0.38% to 2.44%. The grain size increased with the TiCl₄ concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO₂ clusters at the initial stage finally result to the agglomeration of fine TiO₂ grains at high TiCl₄ concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl₄ concentration is below 0.90%.

关键词: Chemical vapor deposition, TiO₂ thin film, Nucleation reaction, Precursor concentration, Pearlescent pigment

Abstract: The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl₄ concentration on the initial deposition of TiO₂ on mica by atmospheric pressure chemical vapor deposition (APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO₂ grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl₄ concentration increased from 0.38% to 2.44%. The grain size increased with the TiCl₄ concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO₂ clusters at the initial stage finally result to the agglomeration of fine TiO₂ grains at high TiCl₄ concentrations. Following the results, it was suggested that the nucleation density and size was easy to be adjusted when the TiCl₄ concentration is below 0.90%.

Key words: Chemical vapor deposition, TiO₂ thin film, Nucleation reaction, Precursor concentration, Pearlescent pigment

Ming Liu, Ying Li, Rui Wang, Guoqiang Shao, Pengpeng Lv, Jun Li, Qingshan Zhu. Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration[J]. 中国化学工程学报, 2023, 60(8): 99-107.

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Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

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