SCI和EI收录∣中国化工学会会刊

›› 2009, Vol. 17 ›› Issue (6): 919-924.

• FLUID FLOW AND TRANSPORT PHENOMENA • Previous Articles     Next Articles

Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

YOU Xueyi1, LI Shenghua2   

  1. 1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, China;
    2. School of Chemical Engineering, Tianjin University, Tianjin 300072, China
  • Received:2009-02-24 Revised:2009-09-18 Online:2009-12-28 Published:2009-12-28
  • Supported by:
    Supported by the National Natural Science Foundation of China (20676093)

Effects of Surface Etch Hole Fault on the Velocity Field in Microchannel Reactors

尤学一1, 李胜华2   

  1. 1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, China;
    2. School of Chemical Engineering, Tianjin University, Tianjin 300072, China
  • 通讯作者: YOU Xueyi,E-mail:xyyou@tju.edu.cn
  • 基金资助:
    Supported by the National Natural Science Foundation of China (20676093)

Abstract: Microchannel reactors are commonly used in micro-chemical technology.The performance of microreactors is greatly affected by the velocity field in the microchannel.The flow field is disturbed by the cylindrical etch holes caused by air dust on the microchannel surface during its processing procedure.In this approach,a two-dimensional computational fluid dynamics(CFD) model is put forward to study the effect of etch holes on flow field.The influenced area of single or two concave etch holes is studied for the case of laminar flow.The hole diameter,the Reynolds number and the distance between the center of holes are found to have influences on the flow field.Numerical results indicate that the effects of etch hole on the flow field should be evaluated and the way of choosing the economic class of cleanroom for microreactor manufacture is presented.

Key words: microchannel, processing faults, etch holes, computational fluid dynamics, velocity field

摘要: Microchannel reactors are commonly used in micro-chemical technology.The performance of microreactors is greatly affected by the velocity field in the microchannel.The flow field is disturbed by the cylindrical etch holes caused by air dust on the microchannel surface during its processing procedure.In this approach,a two-dimensional computational fluid dynamics(CFD) model is put forward to study the effect of etch holes on flow field.The influenced area of single or two concave etch holes is studied for the case of laminar flow.The hole diameter,the Reynolds number and the distance between the center of holes are found to have influences on the flow field.Numerical results indicate that the effects of etch hole on the flow field should be evaluated and the way of choosing the economic class of cleanroom for microreactor manufacture is presented.

关键词: microchannel, processing faults, etch holes, computational fluid dynamics, velocity field