Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon

Abstract

Abstract: Various methods for production of polysilicon have been proposed for lowering the production cost and energy consumption, and enhancing productivity, which are critical for industrial applications. The fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones, but the homo-geneous reaction of silane in FBCVD results in unwanted formation of fines, which will affect the product quality and output. There are some other problems, such as heating degeneration due to undesired polysilicon deposition on the walls of the reactor and the heater. This article mainly reviews the technological development on FBCVD of polycrystalline silicon and the research status for solving the above problems. It also identifies a number of chal-lenges to tackle and principles should be followed in the design of a FBCVD reactor.

Key words: fluidized bed, chemical vapor deposition, fine particles, homogeneous reaction

摘要： Various methods for production of polysilicon have been proposed for lowering the production cost and energy consumption, and enhancing productivity, which are critical for industrial applications. The fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones, but the homo-geneous reaction of silane in FBCVD results in unwanted formation of fines, which will affect the product quality and output. There are some other problems, such as heating degeneration due to undesired polysilicon deposition on the walls of the reactor and the heater. This article mainly reviews the technological development on FBCVD of polycrystalline silicon and the research status for solving the above problems. It also identifies a number of chal-lenges to tackle and principles should be followed in the design of a FBCVD reactor.

关键词: fluidized bed, chemical vapor deposition, fine particles, homogeneous reaction

LI Jianlong, CHEN Guanghui, ZHANG Pan, WANG Weiwen, DUAN Jihai. Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon[J]. , 2011, 19(5): 747-753.

李建隆, 陈光辉, 张攀, 王伟文, 段继海. Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon[J]. , 2011, 19(5): 747-753.

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