SCI和EI收录∣中国化工学会会刊

中国化学工程学报 ›› 2022, Vol. 45 ›› Issue (5): 22-31.DOI: 10.1016/j.cjche.2021.05.012

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Application of pulsed chemical vapor deposition on the SiO2-coated TiO2 production within a rotary reactor at room temperature

Ke Yang1, Shan Zhong1, Hairong Yue1,2, Siyang Tang1, Kui Ma1, Changjun Liu1, Kai Qiao1, Bin Liang1,2   

  1. 1 School of Chemical Engineering, Sichuan University, Chengdu 610065, China;
    2 Institute of New Energy and Low-carbon Technology, Chengdu 610207, China
  • 收稿日期:2021-02-17 修回日期:2021-05-17 出版日期:2022-05-28 发布日期:2022-06-22
  • 通讯作者: Shan Zhong,E-mail:zhongshan@scu.edu.cn
  • 基金资助:
    This work was supported by the National Key Research and Development Program of China (2018YFB0605700), National Natural Science Foundation of China (21908150) and China Postdoctoral Science Foundation (2019M653404).

Application of pulsed chemical vapor deposition on the SiO2-coated TiO2 production within a rotary reactor at room temperature

Ke Yang1, Shan Zhong1, Hairong Yue1,2, Siyang Tang1, Kui Ma1, Changjun Liu1, Kai Qiao1, Bin Liang1,2   

  1. 1 School of Chemical Engineering, Sichuan University, Chengdu 610065, China;
    2 Institute of New Energy and Low-carbon Technology, Chengdu 610207, China
  • Received:2021-02-17 Revised:2021-05-17 Online:2022-05-28 Published:2022-06-22
  • Contact: Shan Zhong,E-mail:zhongshan@scu.edu.cn
  • Supported by:
    This work was supported by the National Key Research and Development Program of China (2018YFB0605700), National Natural Science Foundation of China (21908150) and China Postdoctoral Science Foundation (2019M653404).

摘要: Pulsed chemical vapor deposition (P-CVD) is a promising technology for the surface modification of TiO2 particles. For the scale-up application of P-CVD, a custom-designed rotary reactor and corresponding coating process at room temperature was developed in the present work. The obtained SiO2-coated TiO2 particles were characterized by various measures including high-resolution transmission electron microscope, Fourier transform infrared spectroscopy, X-ray diffraction, etc. The results illustrated that the SiO2 films with a thickness of (3.7 ±0.7) nm were successfully deposited onto the surface of TiO2 particles. According to the dye degradation tests and acid solubility measurement, the deposited film can effectively inhibit the photocatalytic activity and enhance the weatherability of the TiO2 particles. Zeta potential measurements showed that the SiO2-coated TiO2 is possible to be stably dispersed in the pH range of 6.9–11.6. The coating process made the whiteness of TiO2 particles decreased slightly but still sufficient (97.3 ±0.1) for application. Furthermore, the properties of the TiO2 particles coated by P-CVD were compared with the particles coated by traditional wet chemical deposition. It is shown that the P-CVD can produce thinner but denser films with better photoactivity suppression performance. The developed coating process within the rotary reactor was proved practically feasible and convenient for the scale-up production of SiO2-coated TiO2 via P-CVD.

关键词: Film, Pulsed-CVD, Scale-up, Deactivation, Pigmentary properties

Abstract: Pulsed chemical vapor deposition (P-CVD) is a promising technology for the surface modification of TiO2 particles. For the scale-up application of P-CVD, a custom-designed rotary reactor and corresponding coating process at room temperature was developed in the present work. The obtained SiO2-coated TiO2 particles were characterized by various measures including high-resolution transmission electron microscope, Fourier transform infrared spectroscopy, X-ray diffraction, etc. The results illustrated that the SiO2 films with a thickness of (3.7 ±0.7) nm were successfully deposited onto the surface of TiO2 particles. According to the dye degradation tests and acid solubility measurement, the deposited film can effectively inhibit the photocatalytic activity and enhance the weatherability of the TiO2 particles. Zeta potential measurements showed that the SiO2-coated TiO2 is possible to be stably dispersed in the pH range of 6.9–11.6. The coating process made the whiteness of TiO2 particles decreased slightly but still sufficient (97.3 ±0.1) for application. Furthermore, the properties of the TiO2 particles coated by P-CVD were compared with the particles coated by traditional wet chemical deposition. It is shown that the P-CVD can produce thinner but denser films with better photoactivity suppression performance. The developed coating process within the rotary reactor was proved practically feasible and convenient for the scale-up production of SiO2-coated TiO2 via P-CVD.

Key words: Film, Pulsed-CVD, Scale-up, Deactivation, Pigmentary properties