SCI和EI收录∣中国化工学会会刊

›› 2011, Vol. 19 ›› Issue (5): 747-753.

• • 上一篇    下一篇

Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon

李建隆1, 陈光辉1, 张攀2, 王伟文1, 段继海1   

  1. 1. Institute of Chemical Engineering, Qingdao University of Science and Technology, Qingdao 266042, China;
    2. Institute of Electromechanical Engineering, Qingdao University of Science and Technology, Qingdao 266061, China
  • 收稿日期:2010-06-11 修回日期:2011-07-20 出版日期:2011-10-28 发布日期:2011-10-28
  • 通讯作者: LI Jianlong,E-mail:ljlong@qust.edu.cn
  • 基金资助:
    Supported by the Natural Science Foundation of Shandong Province of China (ZR2009BM011);the Doctor Foundation of Shandong Province of China (BS2010NJ005)

Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon

LI Jianlong1, CHEN Guanghui1, ZHANG Pan2, WANG Weiwen1, DUAN Jihai1   

  1. 1. Institute of Chemical Engineering, Qingdao University of Science and Technology, Qingdao 266042, China;
    2. Institute of Electromechanical Engineering, Qingdao University of Science and Technology, Qingdao 266061, China
  • Received:2010-06-11 Revised:2011-07-20 Online:2011-10-28 Published:2011-10-28
  • Supported by:
    Supported by the Natural Science Foundation of Shandong Province of China (ZR2009BM011);the Doctor Foundation of Shandong Province of China (BS2010NJ005)

摘要: Various methods for production of polysilicon have been proposed for lowering the production cost and energy consumption, and enhancing productivity, which are critical for industrial applications. The fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones, but the homo-geneous reaction of silane in FBCVD results in unwanted formation of fines, which will affect the product quality and output. There are some other problems, such as heating degeneration due to undesired polysilicon deposition on the walls of the reactor and the heater. This article mainly reviews the technological development on FBCVD of polycrystalline silicon and the research status for solving the above problems. It also identifies a number of chal-lenges to tackle and principles should be followed in the design of a FBCVD reactor.

关键词: fluidized bed, chemical vapor deposition, fine particles, homogeneous reaction

Abstract: Various methods for production of polysilicon have been proposed for lowering the production cost and energy consumption, and enhancing productivity, which are critical for industrial applications. The fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones, but the homo-geneous reaction of silane in FBCVD results in unwanted formation of fines, which will affect the product quality and output. There are some other problems, such as heating degeneration due to undesired polysilicon deposition on the walls of the reactor and the heater. This article mainly reviews the technological development on FBCVD of polycrystalline silicon and the research status for solving the above problems. It also identifies a number of chal-lenges to tackle and principles should be followed in the design of a FBCVD reactor.

Key words: fluidized bed, chemical vapor deposition, fine particles, homogeneous reaction