Application of pulsed chemical vapor deposition on the SiO2-coated TiO2 production within a rotary reactor at room temperature

doi:10.1016/j.cjche.2021.05.012

中国化学工程学报 ›› 2022, Vol. 45 ›› Issue (5): 22-31.DOI: 10.1016/j.cjche.2021.05.012

Application of pulsed chemical vapor deposition on the SiO₂-coated TiO₂ production within a rotary reactor at room temperature

Ke Yang¹, Shan Zhong¹, Hairong Yue^1,2, Siyang Tang¹, Kui Ma¹, Changjun Liu¹, Kai Qiao¹, Bin Liang^1,2

1 School of Chemical Engineering, Sichuan University, Chengdu 610065, China;
2 Institute of New Energy and Low-carbon Technology, Chengdu 610207, China

收稿日期:2021-02-17 修回日期:2021-05-17 出版日期:2022-05-28 发布日期:2022-06-22
通讯作者: Shan Zhong,E-mail:zhongshan@scu.edu.cn
基金资助:
This work was supported by the National Key Research and Development Program of China (2018YFB0605700), National Natural Science Foundation of China (21908150) and China Postdoctoral Science Foundation (2019M653404).

Application of pulsed chemical vapor deposition on the SiO₂-coated TiO₂ production within a rotary reactor at room temperature

Ke Yang¹, Shan Zhong¹, Hairong Yue^1,2, Siyang Tang¹, Kui Ma¹, Changjun Liu¹, Kai Qiao¹, Bin Liang^1,2

1 School of Chemical Engineering, Sichuan University, Chengdu 610065, China;
2 Institute of New Energy and Low-carbon Technology, Chengdu 610207, China

Received:2021-02-17 Revised:2021-05-17 Online:2022-05-28 Published:2022-06-22
Contact: Shan Zhong,E-mail:zhongshan@scu.edu.cn
Supported by:
This work was supported by the National Key Research and Development Program of China (2018YFB0605700), National Natural Science Foundation of China (21908150) and China Postdoctoral Science Foundation (2019M653404).

摘要/Abstract

摘要： Pulsed chemical vapor deposition (P-CVD) is a promising technology for the surface modification of TiO₂ particles. For the scale-up application of P-CVD, a custom-designed rotary reactor and corresponding coating process at room temperature was developed in the present work. The obtained SiO₂-coated TiO₂ particles were characterized by various measures including high-resolution transmission electron microscope, Fourier transform infrared spectroscopy, X-ray diffraction, etc. The results illustrated that the SiO₂ films with a thickness of (3.7 ±0.7) nm were successfully deposited onto the surface of TiO₂ particles. According to the dye degradation tests and acid solubility measurement, the deposited film can effectively inhibit the photocatalytic activity and enhance the weatherability of the TiO₂ particles. Zeta potential measurements showed that the SiO₂-coated TiO₂ is possible to be stably dispersed in the pH range of 6.9–11.6. The coating process made the whiteness of TiO₂ particles decreased slightly but still sufficient (97.3 ±0.1) for application. Furthermore, the properties of the TiO₂ particles coated by P-CVD were compared with the particles coated by traditional wet chemical deposition. It is shown that the P-CVD can produce thinner but denser films with better photoactivity suppression performance. The developed coating process within the rotary reactor was proved practically feasible and convenient for the scale-up production of SiO₂-coated TiO₂ via P-CVD.

关键词: Film, Pulsed-CVD, Scale-up, Deactivation, Pigmentary properties

Abstract: Pulsed chemical vapor deposition (P-CVD) is a promising technology for the surface modification of TiO₂ particles. For the scale-up application of P-CVD, a custom-designed rotary reactor and corresponding coating process at room temperature was developed in the present work. The obtained SiO₂-coated TiO₂ particles were characterized by various measures including high-resolution transmission electron microscope, Fourier transform infrared spectroscopy, X-ray diffraction, etc. The results illustrated that the SiO₂ films with a thickness of (3.7 ±0.7) nm were successfully deposited onto the surface of TiO₂ particles. According to the dye degradation tests and acid solubility measurement, the deposited film can effectively inhibit the photocatalytic activity and enhance the weatherability of the TiO₂ particles. Zeta potential measurements showed that the SiO₂-coated TiO₂ is possible to be stably dispersed in the pH range of 6.9–11.6. The coating process made the whiteness of TiO₂ particles decreased slightly but still sufficient (97.3 ±0.1) for application. Furthermore, the properties of the TiO₂ particles coated by P-CVD were compared with the particles coated by traditional wet chemical deposition. It is shown that the P-CVD can produce thinner but denser films with better photoactivity suppression performance. The developed coating process within the rotary reactor was proved practically feasible and convenient for the scale-up production of SiO₂-coated TiO₂ via P-CVD.

Key words: Film, Pulsed-CVD, Scale-up, Deactivation, Pigmentary properties

Ke Yang, Shan Zhong, Hairong Yue, Siyang Tang, Kui Ma, Changjun Liu, Kai Qiao, Bin Liang. Application of pulsed chemical vapor deposition on the SiO₂-coated TiO₂ production within a rotary reactor at room temperature[J]. 中国化学工程学报, 2022, 45(5): 22-31.

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Application of pulsed chemical vapor deposition on the SiO₂-coated TiO₂ production within a rotary reactor at room temperature

Application of pulsed chemical vapor deposition on the SiO₂-coated TiO₂ production within a rotary reactor at room temperature

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